The role of cemented WC substrate morphology on the diamond film growth and cracking resistance
- Inst. of Mechanical Engineering, National Chiao Tung Univ., Hsinchu (TW)
- Materials Research Lab., ITRI, Chutung (TW)
Chemical vapor deposition (CVD) synthetic diamond film is well known and widely studied recently for its potential applications in many engineering fields. Due to its extreme strength and hardness, good abrasive resistance, and low friction coefficient, the synthetic film can be used in tribological situations such as machining or wear resistant coatings. In these cases, the film can be grown on cutting tools, dies or sleeves directly. It is expected that the grown film must possess good properties such as film uniformity, smoothness, and especially good adhesion strength (cracking resistance). And these properties are believed to relate to the substrate morphology intimately. In this paper, the authors report on an investigation of the influence of cemented tungsten carbide substrate morphology on the diamond film growth and cracking resistance.
- OSTI ID:
- 7241849
- Journal Information:
- Scripta Metallurgica et Materialia; (United States), Vol. 26:9
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
COATINGS
WEAR RESISTANCE
DIAMONDS
SUBSTRATES
MORPHOLOGY
TUNGSTEN CARBIDES
CHEMICAL VAPOR DEPOSITION
CRACKING
CRYSTAL GROWTH
FILMS
HARDNESS
TRIBOLOGY
CARBIDES
CARBON
CARBON COMPOUNDS
CHEMICAL COATING
CHEMICAL REACTIONS
DECOMPOSITION
DEPOSITION
ELEMENTAL MINERALS
ELEMENTS
MECHANICAL PROPERTIES
MINERALS
NONMETALS
PYROLYSIS
REFRACTORY METAL COMPOUNDS
SURFACE COATING
THERMOCHEMICAL PROCESSES
TRANSITION ELEMENT COMPOUNDS
TUNGSTEN COMPOUNDS
360603* - Materials- Properties
360601 - Other Materials- Preparation & Manufacture
360602 - Other Materials- Structure & Phase Studies