Surface resistance of large-area Tl[sub 2]Ba[sub 2]CaCu[sub 2]O[sub 8] thin films at microwave and millimeter wave frequencies measured by three noncavity techniques
- Du Pont Central Research and Development, Wilmington, DE (United States)
- Sandia National Lab., Allbuquerque, NM (United States)
The surface resistance R[sub s] of Tl[sub 2]Ba[sub 2]CaCu[sub 2]O[sub 8] films fabricated on LaAlO[sub 3] wafers up to 3 inches (7.6 cm) in diameter through a post-deposition anneal process was measured over the frequency range 5.55-94.1 GHz by the following techniques: 5.55 and 27.5 GHz high-temperature superconductor (HTS)-sapphire resonators, 10 GHz parallel plate resonator, and 94.1 GHz scanning confocal resonator. R[sub s] was found to exhibit a quadratic dependence on frequency f at 77 K: R[sub s] oc f[sup 2.0][+-](0.1). The highest-quality films The highest-quality films yield R[sub s] = 145 [+-] 15 [mu][Omega] at 10 GHz and 77 K. Scanning confocal resonator mapping of R[sub s] across a 2-inch (5.1 cm) diameter wafer yielded a base value for R[sub s] of 16 [+-] 1 m[Omega] at 77 K and 94.1 GHz (equivalent to 180 [+-] 10 [mu][Omega] at 10 GHz) and good uniformity in R[sub s] across the wafer. HTS-sapphire resonator measurements of R[sub s] for fifteen 1.2 cm square parts cut from a 3-inch diameter wafer yielded R[sub s] values scaled to 10 GHz of 196 [+-] 10 [mu][Omega] at 80 K. Similar values were measured for Tl[sub 2]Ba[sub 2]CaCu[sub 2]O[sub 8] films prepared on both sides of a 2-inch diameter wafer. R[sub s] values at 10 GHz and 80 K of 147-214 [mu][Omega] were maintained over the course of 40 independent and successive deposition runs and corresponding anneals under nominally identical film fabrication conditions. Surface resistance at 5.55 GHz remained below 80 [mu][Omega] for maximum rf magnetic fields up to 85 Oe at 4.2 K and 7 Oe at 80 K, respectively. 45 refs., 6 figs., 1 tab.
- OSTI ID:
- 7236398
- Journal Information:
- Journal of Superconductivity; (United States), Vol. 6:3; ISSN 0896-1107
- Country of Publication:
- United States
- Language:
- English
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