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Diffusional crack growth and creep rupture of silicon carbide doped with alumina

Journal Article · · Journal of the American Ceramic Society; (United States)
;  [1]
  1. National Industrial Research Inst., Nagoya (Japan)
This study with tensile creep and crack growth behavior of silicon carbide doped with alumina at 1,400 C. Excellent creep resistance was observed for stresses from 150 MPa to 200 MPa. From the creep exponent of 1.4 and the activation energy of 320 kJ/mol, the principal creep mechanism was Coble creep. The creep failure was caused by slow crack growth from a preexisting flaw. The crack was found to grow subcritically along grain boundaries almost in isolation. The relation between the time-to-failure and the applied stress was well treated by a diffusive crack growth model, and the threshold stress of this material at 1,400 C was estimated at 165 MPa.
OSTI ID:
7233558
Journal Information:
Journal of the American Ceramic Society; (United States), Journal Name: Journal of the American Ceramic Society; (United States) Vol. 77:3; ISSN 0002-7820; ISSN JACTAW
Country of Publication:
United States
Language:
English

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