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Orientation of YBa[sub 2]Cu[sub 3]O[sub 7[minus][ital x]] films on unbuffered and CeO[sub 2]-buffered yttria-stabilized zirconia substrates

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.357245· OSTI ID:7229340
;  [1]; ;  [2]
  1. Department of Materials Science and Engineering, The Pennsylvania State University, University Park, Pennsylvania 16802 (United States)
  2. Superconductivity Technology Center, Los Alamos National Laboratory, Los Alamos, New Mexico 87545 (United States)

YBa[sub 2]Cu[sub 3]O[sub 7[minus][ital x]] (YBCO) films deposited by pulsed laser ablation on unbuffered and CeO[sub 2]-buffered yttria-stabilized zirconia (YSZ) substrates were studied by x-ray diffraction and transmission electron microscopy to investigate film orientation. From [phi] scans it was determined that the unbuffered films possess two major in-plane orientation relationships with the substrate. Both have (001)[sub YBCO][parallel](001)[sub YSZ], with either [100][sub YBCO][parallel][100][sub YSZ] or [110][sub YBCO][parallel][100][sub YSZ], a 0[degree] or 45[degree] orientation, respectively. As deposition temperature increases, satellite peaks that straddle the 0[degree] or 45[degree] orientations develop. The [Sigma] boundary and near coincident site lattice descriptions are applied to the discussion of these misorientations. In general the CeO[sub 2]-buffered YBCO films align with to the 45[degree] orientation to the CeO[sub 2] buffer layer. Out-of-plane film orientation was investigated for both unbuffered and CeO[sub 2]-buffered YBCO films and expressed as a ratio of the amount of [ital c][perpendicular] material to [ital a][perpendicular] material. Buffered films exhibited [ital c][perpendicular] material to [ital a][perpendicular] material ratios approximately twice those of unbuffered films. Transmission electron microscopy combined with the x-ray data was used to develop an explanation for the trends in the variation of the [ital c][perpendicular]/[ital a][perpendicular] ratio with film deposition temperature.

OSTI ID:
7229340
Journal Information:
Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 76:8; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English