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Pulsed electroreduction of CO[sub 2] on copper electrodes-II

Journal Article · · Journal of the Electrochemical Society; (United States)
DOI:https://doi.org/10.1149/1.2054886· OSTI ID:7202870
; ;  [1]
  1. Kyushu Inst. of Tech., Kitakyushu (Japan). Dept. of Electrical Engineering

The pulsed method newly developed by the present authors was applied to electroreduction of CO[sub 2] on Cu electrodes. It was found that the optimum cathodic bias for generating CH[sub 4] and C[sub 2]H[sub 4] was [minus]2.6 V vs. SCE, and the optimum anodic bias for the generation of C[sub 2]H[sub 4] was slightly more anodic than that of CH[sub 4]. Total faradaic efficiency [eta][sub HC] for the generation of CH[sub 4] and C[sub 2]H[sub 4] became a maximum at 10 C and reached about 655. Furthermore, [eta][sub HC] increased with increasing reduction time due to the poisoning effect of the products. It was proposed that some surface intermediate formed by the interaction between CO[sub 2] and the thin oxide layer on a Cu electrode is finally reduced to CH[sub 4] or C[sub 2]H[sub 4], depending on the anodic reactions taking place during the anodic period.

OSTI ID:
7202870
Journal Information:
Journal of the Electrochemical Society; (United States), Journal Name: Journal of the Electrochemical Society; (United States) Vol. 141:5; ISSN 0013-4651; ISSN JESOAN
Country of Publication:
United States
Language:
English