Electrochromic properties of niobium oxide thin films prepared by chemical vapor deposition

Journal Article · Sat Oct 01 04:00:00 EDT 1994 · Journal of the Electrochemical Society; (United States)

DOI:https://doi.org/10.1149/1.2059247· OSTI ID:7181522

Maruyama, Toshiro; Kanagawa, Tetsuya ^[1]

---

1. Kyoto Univ. (Japan). Dept. of Chemical Engineering

Electrochromic niobium oxide thin films were prepared by chemical vapor deposition. The source material was niobium(V) ethoxide. Amorphous niobium oxide thin films were obtained at a substrate temperature 350 C. Reduction and oxidation of the films in a 0.1M Na[sub 2]Co[sub 3] + 0.1M NaHCO[sub 3] buffer solution resulted in desirable changes in optical absorption. Coulometry indicated that the coloration efficiency was 160 cm[sup 2].

• OSTI ID: 7181522
• Journal Information: Journal of the Electrochemical Society; (United States), Journal Name: Journal of the Electrochemical Society; (United States) Vol. 141:10; ISSN JESOAN; ISSN 0013-4651
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360601* -- Other Materials-- Preparation & Manufacture
360606 -- Other Materials-- Physical Properties-- (1992-)
CHALCOGENIDES
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COLOR
DEPOSITION
ELECTRO-OPTICAL EFFECTS
ELECTROCHROMISM
ELECTRON SPECTROSCOPY
NIOBIUM COMPOUNDS
NIOBIUM OXIDES
OPTICAL PROPERTIES
ORGANOLEPTIC PROPERTIES
OXIDES
OXYGEN COMPOUNDS
PHOTOELECTRON SPECTROSCOPY
PHYSICAL PROPERTIES
REFRACTORY METAL COMPOUNDS
SPECTROPHOTOMETRY
SPECTROSCOPY
SURFACE COATING
TRANSITION ELEMENT COMPOUNDS
X-RAY SPECTROSCOPY