skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Epitaxial InAs-coupled superconducting junctions

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.343594· OSTI ID:7166666
; ;  [1]
  1. Electrical Communications Laboratories, Nippon Telegraph and Telephone Corporation, 3-9-11 Musashino-shi, Tokyo 180, Japan (JP)

Homoepitaxial {ital n}-type InAs-coupled superconducting junctions are investigated. The {ital n}-type channel layer on a {ital p}-type substrate has nearly the same mobility as bulk crystal and the layer can be isolated electrically from the substrate by the built-in potential at the {ital p}-{ital n} interface. As a result, the critical current-normal resistance ({ital I}{sub {ital C}}{ital R}{sub {ital N}}) product of the homoepitaxial {ital n}-type InAs-coupled junction is at least 30 times better than those of the bulk {ital n}-type ones. The coherence length {xi}{sub {ital N}} is calculated using the experimentally obtained carrier concentration, mobility, and effective mass. Temperature dependence of {ital I}{sub {ital C}} agrees with calculations based on the proximity effect theory which can be applied to the intermediate regime between the clean and dirty limits.

OSTI ID:
7166666
Journal Information:
Journal of Applied Physics; (USA), Vol. 66:12; ISSN 0021-8979
Country of Publication:
United States
Language:
English