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Mutual diffusion in the titanium-vanadium-niobium system

Journal Article · · Sov. Phys. J. (Engl. Transl.); (United States)
OSTI ID:7156371
This paper investigates mutual diffusion in the Ti-V-Nb system at 1000 and 1200 C. A computation is performed by thee Matano-Kirkaldy method for 89 points of an isothermal section at 1200 C and 101 points at 1000 C. Niobium was selected as solvent. It is found that the diagonal mutual diffusion coefficients grow by almost two orders as the composition approaches the titanium angle. Nondiagonal coefficients take on both positive and negative values.
Research Organization:
Kazakh Chemicotechnological Institute
OSTI ID:
7156371
Journal Information:
Sov. Phys. J. (Engl. Transl.); (United States), Journal Name: Sov. Phys. J. (Engl. Transl.); (United States) Vol. 28:10; ISSN SOPJA
Country of Publication:
United States
Language:
English