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Vibrational relaxation of highly excited SiF sub 4 and C sub 6 F sub 5 H by Ar

Journal Article · · Journal of Chemical Physics; (USA)
DOI:https://doi.org/10.1063/1.458372· OSTI ID:7151608
;  [1]
  1. Department of Chemistry, University of Illinois at Chicago, Chicago, Illinois 60680 (USA)
The vibrational relaxation of SiF{sub 4} and C{sub 6}F{sub 5}H in an Ar bath was measured as a function of initial energy using the method of time-resolved optoacoustics. SiF{sub 4} was found to relax nonexponentially, with a rate constant which varied approximately as the vibrational energy raised to the 3/2 power. This behavior is similar to that observed earlier for SF{sub 6}+Ar below the bottleneck. In contrast, C{sub 6}F{sub 5}H was observed to decay exponentially, as expected for a large molecule in the quasicontinuum. These two types of behavior are discussed in the context of previously proposed propensity rules for the vibrational relaxation of highly excited molecules.
DOE Contract Number:
FG02-88ER13827
OSTI ID:
7151608
Journal Information:
Journal of Chemical Physics; (USA), Journal Name: Journal of Chemical Physics; (USA) Vol. 92:10; ISSN JCPSA; ISSN 0021-9606
Country of Publication:
United States
Language:
English