Apparatus and method for depositing coating onto porous substrate
Disclosed is an apparatus for forming a chemically vapor deposited coating on a porous substrate where oxygen from a first gaseous reactant containing a source of oxygen permeates through the pores of the substrate to react with a second gaseous reactant that is present on the other side of the substrate. The apparatus includes means for controlling the pressure and flow rate of each gaseous reactant, a manometer for measuring the difference in pressure between the gaseous reactants on each side of the substrate, and means for changing the difference in pressure between the gaseous reactants. Also disclosed is a method of detecting and closing cracks in the coating by reducing the pressure difference between the two gaseous reactants whenever the pressure difference falls suddenly after gradually rising, then again increasing the pressure difference on the two gases. The attack by the by-products of the reaction on the substrate are reduced by maintaining the flow rate of the first reactant through the pores of the substrate. 1 fig.
- Research Organization:
- Westinghouse Electric Corp., Pittsburgh, PA (United States)
- DOE Contract Number:
- AC02-80ET17089
- Assignee:
- Westinghouse Electric Corp., Pittsburgh, PA (United States)
- Patent Number(s):
- US 4609562; A
- Application Number:
- PPN: US 6-684438
- OSTI ID:
- 7151437
- Resource Relation:
- Patent File Date: 20 Dec 1984
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
MATERIALS
CHEMICAL VAPOR DEPOSITION
POROUS MATERIALS
VAPOR DEPOSITED COATINGS
EQUIPMENT
PERMEABILITY
CHEMICAL COATING
COATINGS
DEPOSITION
SURFACE COATING
360101* - Metals & Alloys- Preparation & Fabrication
360201 - Ceramics
Cermets
& Refractories- Preparation & Fabrication
360601 - Other Materials- Preparation & Manufacture