Apparatus and method for depositing coating onto porous substrate

Patent · 02 September 1986

OSTI ID:7151437

Isenberg, A O; Zymboly, G E

Disclosed is an apparatus for forming a chemically vapor deposited coating on a porous substrate where oxygen from a first gaseous reactant containing a source of oxygen permeates through the pores of the substrate to react with a second gaseous reactant that is present on the other side of the substrate. The apparatus includes means for controlling the pressure and flow rate of each gaseous reactant, a manometer for measuring the difference in pressure between the gaseous reactants on each side of the substrate, and means for changing the difference in pressure between the gaseous reactants. Also disclosed is a method of detecting and closing cracks in the coating by reducing the pressure difference between the two gaseous reactants whenever the pressure difference falls suddenly after gradually rising, then again increasing the pressure difference on the two gases. The attack by the by-products of the reaction on the substrate are reduced by maintaining the flow rate of the first reactant through the pores of the substrate. 1 fig.

• Research Organization: Westinghouse Electric Corp
• DOE Contract Number: AC02-80ET17089
• Assignee: Westinghouse Electric Corp., Pittsburgh, PA (United States)
• Patent Number(s): US 4609562; A
• Application Number: PPN: US 6-684438
• OSTI ID: 7151437
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
360201 -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360601 -- Other Materials-- Preparation & Manufacture
CHEMICAL COATING
CHEMICAL VAPOR DEPOSITION
COATINGS
DEPOSITION
EQUIPMENT
MATERIALS
PERMEABILITY
POROUS MATERIALS
SURFACE COATING
VAPOR DEPOSITED COATINGS