A reasonably practical XUV laser for applications

Journal Article · Thu Sep 01 04:00:00 EDT 1994 · IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (United States)

DOI:https://doi.org/10.1109/3.328587· OSTI ID:7148852

Clement, T S; Toth, C; Wu, J; Young, J F ^[1]

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1. William Marsh Rice Univ., Houston, TX (United States)

The authors describe a laboratory-scale 109 nm Xe Auger laser pumped by an all-commercial high-repetition-rate Nd:YAG laser system. The Xe laser provides pulse energies up to 1 [mu]J, and an average flux of 3 [times] 10[sup 12] photons/s at 11.5 eV. Measurements of the gain, output energy, and output beam shape are reported, along with an investigation of the time dependence of the gain.

• OSTI ID: 7148852
• Journal Information: IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (United States), Journal Name: IEEE Journal of Quantum Electronics (Institute of Electrical and Electronics Engineers); (United States) Vol. 30:9; ISSN 0018-9197; ISSN IEJQA7
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
426002* -- Engineering-- Lasers & Masers-- (1990-)
BEAM PROFILES
ELECTROMAGNETIC RADIATION
EXTREME ULTRAVIOLET RADIATION
GAS LASERS
IONIZING RADIATIONS
LASER MATERIALS
LASERS
MATERIALS
OPERATION
OPTICAL PUMPING
PUMPING
RADIATIONS
SOFT X RADIATION
TIME DEPENDENCE
ULTRAVIOLET RADIATION
USES
X RADIATION