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Title: Gas-phase reactions of Si/sup +/ with ammonia and the amines (CH/sub 3/)/sub x/ NH/sub 3-x/ (x = 1-3): possible ion-molecule reaction pathways toward SiH, SiCH, SiNH, SiCH/sub 3/, SiNCH/sub 3/, and H/sub 2/SiNH

Journal Article · · J. Am. Chem. Soc.; (United States)
DOI:https://doi.org/10.1021/ja00216a010· OSTI ID:7148592

Rate constants and product distributions have been determined for gas-phase reactions of ground-state Si/sup +/(/sup 2/P) ions with ammonia and the amines (CH/sub 3/)/sub x/NH/sub 3-x/ (x = 1-3) at 296 +- 2 K with the selected-ion flow tube technique. All reactions were observed to be fast and can be understood in terms of Si/sup +/ insertion into N-H and C-N bonds to form ions of the type SiNR/sub 1/R/sub 2//sup +/ (r/sub 1/, R/sub 2/ = H, CH/sub 3/) proceeding in competition (in the case of the amines) with hydride ion transfer to form immonium ions of the type CH/sub 2/NR/sub 1/R/sub 2//sup +/ (R/sub 1/, R/sub 2/ = H, CH/sub 3/). C-N bond insertion appears more efficient than N-H bond insertion. The contribution of hydride ion transfer increases with increasing stability of the immonium ion. The latter reaction leads directly to SiH as a neutral product. Other minor reaction channels were seen which lead directly or indirectly to SiCH and SiCH/sub 3/. Rapid secondary proton transfer reactions were observed for SiNH/sub 2//sup +/ and SiNHCH/sub 3//sup +/ to produce gas-phase SiNH and SiNCH/sub 3/ molecules. With methylamine SiNH/sub 2//sup +/ also appears to produce H/sub 2/SiNH/sub 2//sup +/ which may deprotonate to form the simplest silanimine, H/sub 2/SiNH, or aminosilylene, HSiNH/sub 2/. Reactions of this type are of interest in molecular synthesis and here are proposed to contribute to the formation of SiH, SiCH, SiNH, SiCH/sub 3/, and H/sub 2/SiNH or HSiNH/sub 2/ in partially ionized interstellar gas clouds containing silicon, ammonia, and methylamines.

Research Organization:
York Univ., Downsview, Ontario (Canada)
OSTI ID:
7148592
Journal Information:
J. Am. Chem. Soc.; (United States), Vol. 110:8
Country of Publication:
United States
Language:
English