1-ns high-power high-repetitive excimer laser oscillator

Journal Article · Mon Feb 01 04:00:00 EST 1988 · IEEE J. Quant. Electron.; (United States)

DOI:https://doi.org/10.1109/3.112· OSTI ID:7147135

Yamada, K; Miyazaki, K; Hasama, T; Sato, T

A 1-ns high-power high-repetitive excimer laser oscillator has been developed. The peak power obtained was more than 1 MW with 1-ns pulse width for both XeCl and KrF gas mixtures. The characteristic output power per unit active volume is calculated to be more than 2 GW/1, which is nearly one order larger than that extracted from usual discharge devices. It is inferred that the gain depletion in the active medium under such an extremely large output power condition has led to successful pulse shortening. This device can be operated at a repetition frequency of at least 500 Hz without any gas circulation system. The beam divergence was reduced down to near the diffraction limit, although the oscillated-pulse width is only 1 ns.

• Research Organization: Electrotechnical Lab., Sakura-mura, Niihari-gun, Ibaraki 305 (JP)
• OSTI ID: 7147135
• Journal Information: IEEE J. Quant. Electron.; (United States), Journal Name: IEEE J. Quant. Electron.; (United States) Vol. 24:2; ISSN IEJQA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
CHLORIDES
CHLORINE COMPOUNDS
DISPERSIONS
ELECTRONIC EQUIPMENT
EMISSION
ENERGY-LEVEL TRANSITIONS
EQUIPMENT
EXCIMER LASERS
FABRICATION
FLUIDS
FLUORIDES
FLUORINE COMPOUNDS
FREQUENCY RANGE
GAS LASERS
GASES
HALIDES
HALOGEN COMPOUNDS
HZ RANGE
KRYPTON CHLORIDE LASERS
KRYPTON COMPOUNDS
KRYPTON FLUORIDES
LASERS
MIXTURES
OSCILLATORS
POWER
PULSES
RARE GAS COMPOUNDS
STIMULATED EMISSION
XENON CHLORIDES
XENON COMPOUNDS