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Study of recombination reaction CH/sub 3/ + CH/sub 3/. -->. C/sub 2/H/sub 6/. 1. Experiment

Journal Article · · J. Phys. Chem.; (United States)
DOI:https://doi.org/10.1021/j100320a015· OSTI ID:7143929

The recombination of methyl radicals has been studied as a function of temperature and bath gas density to obtain more detailed knowledge of the kinetics of this reaction in the unimolecular falloff region. The reaction was studied by two techniques: (1) use of a tubular reactor coupled to a photoionization mass spectrometer; (2) use of absorption spectroscopy with a stainless steel flow cell. In both cases, methyl radicals were generated homogeneously by the pulsed photolysis of acetone at 193 nm. CH/sub 3/ decay profiles were monitored in real-time experiments. Absolute CH/sub 3/ concentrations were obtained from direct measurements of acetone photodecomposition in the photoionization experiments and from previously determined cross sections in the absorption experiments. Rate constants for the CH/sub 3/ + CH/sub 3/ reaction are reported, with argon as the bath gas, at nine temperatures in the range 296-906 K and at gas densities from 1.8 x 10/sup 16/ to 1.4 x 10/sup 19/ molecules cm/sup -3/. A significantly narrower range of conditions was used in additional experiments using helium as the bath gas. The results obtained are compared with theoretical values of the CH/sub 3/ + CH/sub 3/ recombination rate constant obtained in part 2 (following paper in this issue). The combined results of the experimental and theoretical study of this reaction provide a more quantitative description of the role of collisions in this important recombination process. The uncertainty associated with extrapolating unimolecular rate constants to higher temperatures by using a common functional representation of the pressure and temperature dependence of such rate constants is illustrated with a comparison of theory and extrapolatioon up to 2000 K for the CH/sub 3/ + CH/sub 3/ high-pressure-limit rate constant.

Research Organization:
Illinois Institute of Technology, Chicago (USA)
OSTI ID:
7143929
Journal Information:
J. Phys. Chem.; (United States), Journal Name: J. Phys. Chem.; (United States) Vol. 92:9; ISSN JPCHA
Country of Publication:
United States
Language:
English