Sputter-deposition and characterization of molybdenum disulfide thin films

Technical Report · Wed Sep 09 00:00:00 EDT 1992

OSTI ID:7139704

Obeng, J

MoS[sub x] films were deposited on Si substrates by rf planar magnetron sputtering of hot-pressed MoS[sub 2] in Ar or H[sub 2]S/Ar and of Mo in H[sub 2]S/Ar. Results indicated that MoS[sub x] film properties can be controlled more easily by sputtering Mo in H[sub 2]S/Ar. The surface-sensitive technique of IRRAS (infrared reflection-absorption spectroscopy) was used to study CO adsorption on MoS[sub x] thin films sputter-deposited on Si, Au/Si and Pt/Si substrates. The spectra suggested mainly gas phase CO with multiple absorption bands about the 2162 and 2114 cm[sup [minus]1] regions for CO pressures over 30 torr; no CO bands were observed for monolayer coverages. Progress was made in sputter-depositing MoS[sub x]/metal/Si thin films with preferred orientation.

• Research Organization: Ames Lab., IA (United States)
• Sponsoring Organization: USDOE; USDOE, Washington, DC (United States)
• DOE Contract Number: W-7405-ENG-82
• OSTI ID: 7139704
• Report Number(s): IS-T-1597; ON: DE93004801
• Resource Relation: Other Information: Thesis (M.S.)
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
MOLYBDENUM SULFIDES
DEPOSITION
SURFACE PROPERTIES
ADSORPTION
ARGON
CARBON MONOXIDE
CONTROLLED ATMOSPHERES
HYDROGEN SULFIDES
INFRARED SPECTRA
MAGNETRONS
ORIENTATION
REFLECTION
RF SYSTEMS
SPUTTERING
THIN FILMS
ATMOSPHERES
CARBON COMPOUNDS
CARBON OXIDES
CHALCOGENIDES
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FILMS
FLUIDS
GASES
HYDROGEN COMPOUNDS
MICROWAVE EQUIPMENT
MICROWAVE TUBES
MOLYBDENUM COMPOUNDS
NONMETALS
OXIDES
OXYGEN COMPOUNDS
RARE GASES
REFRACTORY METAL COMPOUNDS
SORPTION
SPECTRA
SULFIDES
SULFUR COMPOUNDS
TRANSITION ELEMENT COMPOUNDS
360601* - Other Materials- Preparation & Manufacture
360606 - Other Materials- Physical Properties- (1992-)