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Epitaxial growth of Ba[sub 1[minus][ital x]]K[sub [ital x]]BiO[sub 3] thin films by pulsed-laser deposition

Journal Article · · Applied Physics Letters; (United States)
DOI:https://doi.org/10.1063/1.108919· OSTI ID:7123682
; ; ;  [1]
  1. Solid State Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, Tennessee 37831-6056 (United States)
Epitaxial Ba[sub 1[minus][ital x]]K[sub [ital x]]BiO[sub 3] thin films have been grown by pulsed-laser deposition at temperatures as low as 400 [degree]C. Films have been grown on (100) MgO and SrTiO[sub 3] with [ital T][sub [ital c]]([ital R]=0)=19.5 K and transition widths less than 1 K. Four circle x-ray diffraction shows that these epitaxial films are mostly (00[ital l]) oriented with good in-plane epitaxy. We find that, especially for growth on (100) MgO, an initial epitaxial layer of BaBiO[sub 3] grown at 600 [degree]C significantly improves the properties of the Ba[sub 1[minus][ital x]]K[sub [ital x]]BiO[sub 3] films.
DOE Contract Number:
AC05-84OR21400
OSTI ID:
7123682
Journal Information:
Applied Physics Letters; (United States), Journal Name: Applied Physics Letters; (United States) Vol. 62:4; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English