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Circular dichroism in core-level photoemission from nonmagnetic and magnetic systems: A photoelectron diffraction viewpoint (abstract)

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.358229· OSTI ID:7122068
 [1];  [2];  [3]; ;  [1];  [4]
  1. Materials Sciences Division, Lawrence Berkeley Laboratory, Berkeley, California 94720 (United States)
  2. Physics Department, University of California, Davis, California 95616 (United States)
  3. MSIN K2-12, Battelle Pacific Northwest Laboratory, Richland, Washington 99532 (United States)
  4. Physics Department, University of California, Davis, California 95616 (United States) Materials Sciences Division, Lawrence Berkeley Laboratory, Berkeley, California 94720 (United States)

Magnetic circular dichroism (MCD) in x-ray absorption represents an exciting new technique for studying and imaging magnetic systems. However, there are to date relatively few studies of dichroism in the inherent process involved: photoelectron emission. We will here illustrate that photoelectron diffraction (PD) theory provides a fruitful way of analyzing dichroism data for both nonmagnetic and magnetic systems. Circular dichroism (CD) has been observed in core-level photoemission from nonmagnetic systems: C 1s from CO/Pd(111) and Si 2[ital p] from Si(100). For CO/PD(111), chirality in the experimental geometry is readily discernible, but for Si(100), it is more difficult to define the chirality with simple vector relationships. PD effects implicitly contain all information on such core-level dichroism, and we will present multiple-scattering simulations of the observations to date. We will also discuss the role of such CD effects in core-level MCD measurements, using Fe 2[ital p] emission from magnetically aligned Fe(110) as an example. The analysis of such MCD data has so far been qualitative. We will present a more quantitative analysis including final-state effects such as the interference of [ital l][plus minus]1 photoelectron channels and spin-dependent scattering and diffraction.

OSTI ID:
7122068
Journal Information:
Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 76:10; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English