Sulfidation behavior of Fe-25Cr-20Ni-Si in H sub 2 /H sub 2 O/H sub 2 S/Ar at 700 degrees C
- Westinghouse Electric Corp., Orlando, FL (United States)
- Oak Ridge National Lab., TN (United States). Metals and Ceramics Div.
This paper reports that the isothermal and cyclic sulfidation behavior of Fe-25CR-20Ni-3Si and Fe-25Cr-20Ni (wt%) was studies at 700{degrees}C in several H{sub 2}H{sub 2}O/H{sub 2}S/Ar gas mixtures. A range of partial pressures of oxygen, 1.17 {times} 10{sup {minus}20} to 1.18 {times} 10{sup {minus}22} atm was used at a constant sulfur potential of 1.22 {times} 10{sup {minus}8} atm. Alloy coupons with a without preoxidation were exposed to the gas mixtures for times up to 92 h. Alloys were preoxidated for up to 96 h at 700{degrees}C in an H{sub 2}/H{sub 2}O/Ar gas mixture with pO{sub 2} = 1.13 {times} 10{sup {minus}20} atm. The oxide scale and corrosion products were analyzed using SEM/EDAX, XRD, SAM, and SIMS. A remarkable sulfidation resistance in the case of Si-containing alloy was observed under the conditions examined, and the interpretation of this observation is discussed. The base alloy, Fe-25Cr-20Ni, underwent sulfidation within a few minutes of exposure to the bioxidant gas mixture, beginning at the gas/scale interface.
- DOE Contract Number:
- AC05-84OR21400
- OSTI ID:
- 7116154
- Journal Information:
- Corrosion (Houston); (United States), Journal Name: Corrosion (Houston); (United States) Vol. 47:9; ISSN 0010-9312; ISSN CORRA
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
360102 -- Metals & Alloys-- Structure & Phase Studies
360105* -- Metals & Alloys-- Corrosion & Erosion
ALLOYS
ARGON
CHALCOGENIDES
CHEMICAL COMPOSITION
CHEMICAL REACTIONS
CHROMIUM ALLOYS
COHERENT SCATTERING
CORROSION
CORROSION RESISTANT ALLOYS
DATA
DIFFRACTION
DISPERSIONS
ELECTRON MICROSCOPY
ELEMENTS
EXPERIMENTAL DATA
FLUIDS
GASES
HYDROGEN
HYDROGEN COMPOUNDS
INFORMATION
INTERFACES
IRON ALLOYS
IRON BASE ALLOYS
MASS SPECTROSCOPY
MICROSCOPY
MIXTURES
NONMETALS
NUMERICAL DATA
OXIDES
OXYGEN
OXYGEN COMPOUNDS
RARE GASES
SCANNING ELECTRON MICROSCOPY
SCATTERING
SILICON ALLOYS
SPECTROSCOPY
SULFIDATION
TEMPERATURE RANGE
TEMPERATURE RANGE 0400-1000 K
WATER
X-RAY DIFFRACTION