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Increased range of Fermi-level stabilization energy at metal/melt-grown GaAs(100) interfaces

Conference · · Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States)
OSTI ID:7115705
; ;  [1];  [2]; ; ;  [3]
  1. Xerox Webster Research Center, NY (United States)
  2. Univ. of Wisconsin, Madison (United States)
  3. IBM T.J. Watson Research Center, Yorktown Heights, NY (United States)

The authors report a room temperature soft x-ray photoemission spectroscopic study of electronic barrier formation and chemistry at Al, Ag, and Au contacts with horizontal Bridgman-grown GaAs(100) surfaces, prepared by etching, heat-cleaning in situ, and As-capping. They observed a pronounced chemical reaction with formation of dissociated Ga for Al, a minimal interface reaction for Ag, and interdiffusion for Au. However, they formed significant differences in the interface electronic barrier heights between the present metal/melt-grown (100) surfaces. They obtained Schottky barrier heights of 0.62, 0.85, and 1.03 eV respectively for Al, Ag, and Au/GaAs interfaces covering a range of 0.41 eV - in contrast to the 0.2-0.3 eV range obtained earlier for both cleaved (110) and heat-cleaned (100) surfaces as well as the 0.7 eV range observed for metal/molecular beam epitaxy GaAs(100) interfaces. This intermediate behavior underscores the dependence of barrier height variation on different growth and interface processing techniques.

OSTI ID:
7115705
Report Number(s):
CONF-910115--
Journal Information:
Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States), Journal Name: Journal of Vacuum Science and Technology. B, Microelectronics Processing and Phenomena; (United States) Vol. 9:4; ISSN 0734-211X; ISSN JVTBD
Country of Publication:
United States
Language:
English

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