Electron densities and temperatures in a xenon afterglow with heavy-ion excitation
- Fakultaet fuer Physik E12, Technische Universitaet Muenchen, D-85748 Garching (Germany)
- Department of Physics, Rutgers University, Newark, New Jersey 07102 (United States)
The time dependence of electron densities and temperatures in a heavy-ion-beam-excited gas target has been determined. A pulsed beam of 89-MeV [sup 32]S ions, 2-ns pulse width, was used for the excitation of xenon at pressures of 500, 1000, and 1500 hPa. This type of excitation leads to the formation of a unique afterglow plasma. Electron densities and temperatures are of the order of those found in typical low-pressure gas discharges, but the electrons, ions, and excited atoms are embedded in a cold, dense gas. Molecule formation is therefore an important process. The dissociative recombination of Xe[sub 2][sup +*] molecules, which leads to the emission of the second excimer continuum of xenon at a wavelength of 172 nm, was used as a probe at times longer than 200 ns after termination of the beam pulses. The emission of light at shorter times was modeled by solving the coupled rate equations of the collisional and radiative processes involved.
- OSTI ID:
- 7093484
- Journal Information:
- Physical Review. E, Statistical Physics, Plasmas, Fluids, and Related Interdisciplinary Topics; (United States), Vol. 50:5; ISSN 1063-651X
- Country of Publication:
- United States
- Language:
- English
Similar Records
Influence of gas pressure and applied voltage on Xe excimer radiation from a micro dielectric barrier discharge for plasma display panel
Time and wavelength resolved spectroscopy for proton excited xenon
Related Subjects
XENON
PLASMA DIAGNOSTICS
AFTERGLOW
ELECTRON DENSITY
ELECTRON TEMPERATURE
EXCITATION
ION BEAMS
MEV RANGE 100-1000
PULSE TECHNIQUES
SILICON IONS
BEAMS
CHARGED PARTICLES
ELEMENTS
ENERGY RANGE
ENERGY-LEVEL TRANSITIONS
FLUIDS
GASES
IONS
MEV RANGE
NONMETALS
RARE GASES
700320* - Plasma Diagnostic Techniques & Instrumentation- (1992-)