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Interfacial reaction of BN/Ni/sub 3/Al

Journal Article · · Appl. Phys. Lett.; (United States)
DOI:https://doi.org/10.1063/1.100467· OSTI ID:7090462
Interfacial reaction between BN and Ni/sub 3/Al was studied by diffusion bonding at 1000 /sup 0/C. Error function type diffusion profiles of Ni and Al were observed. Al enrichment at the interface was detected. Kirkendall voids (Trans. Am. Inst. Min. Eng. 171, 130 (1947)) with faceted interfaces were observed in the interdiffusion zone of Ni/sub 3/Al side. In situ fractured interface showed a typical heterogeneous interfacial reaction. Three-dimensional Ni clusters were observed to grow into islands, and unevenly distributed in an alumina matrix of whisker form. The intriguing pattern of the outdiffusion and clustering of Ni atoms, as compared to Al, during the chemical interdiffusion between BN and Ni/sub 3/Al is discussed based upon grain boundary diffusion, diffusion environment, and thermodynamic driving force under oxygen environment.
Research Organization:
Research and Development, Engelhard Corporation, Edison, New Jersey 08818
OSTI ID:
7090462
Journal Information:
Appl. Phys. Lett.; (United States), Journal Name: Appl. Phys. Lett.; (United States) Vol. 53:16; ISSN APPLA
Country of Publication:
United States
Language:
English