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Nascent rovibrational distribution of O/sup +//sub 2/(A /sup 2/Pi/sub u/) produced by He(2 /sup 3/S) Penning ionization of O/sub 2/

Journal Article · · J. Chem. Phys.; (United States)
OSTI ID:7087517
The He(2 /sup 3/S) Penning ionization of O/sub 2/ to give O/sup +//sub 2/(A /sup 2/Pi/sub u/) has been studied by observing the O/sup +//sub 2/(A /sup 2/Pi/sub u/--X /sup 2/Pi/sub g/) emission in beam and flowing afterglow apparatus. A comparison of beam and flowing afterglow data indicates that the nascent rovibrational distribution is lost in the flowing afterglow due to collisional relaxation. The nascent vibrational distribution of O/sup +//sub 2/(A /sup 2/Pi/sub u/) shifts to lower vibrational levels in comparison with the Franck--Condon factors for vertical O/sub 2/(X)..-->..O/sup +//sub 2/(A) ionization. The rotational temperature decreases from 4200 K for v' = 0 to 400 K for v' = 13. Vibrational relaxation of O/sup +//sub 2/(A) accompanied by a significant rotational excitation is explained as a result of a short-range repulsive interaction (He--O/sup +//sub 2/(A)..-->..He+O/sup +//sub 2/(A)) in the exit channel.
Research Organization:
Institute of Advanced Material Study and Department of Molecular Science and Technology, Graduate School of Engineering Sciences, Kyushu University, Kasuga-shi, Fukuoka, 816 Japan
OSTI ID:
7087517
Journal Information:
J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 89:11; ISSN JCPSA
Country of Publication:
United States
Language:
English