Real time Monte Carlo simulation of thin film nucleation in localized-laser chemical vapor deposition
A real time Monte Carlo simulation is used to model the nucleation and initial stages of thin film growth during localized-laser chemical vapor deposition (LLCVD). This model includes the effects of laser--substrate heating, heterogeneous pyrolytic decomposition of parent molecules on the laser-heated region of the surface, and adatom migration and desorption dynamics. The amount of material deposited as a function of time is obtained over a surface area of 150 x 150 A for various values of the substrate temperature, parent gas pressure, and adsorbate--substrate binding energy. Additional information is obtained about the cluster density, and the role of surface defects and two-atom cluster dynamics on the initial growth rate. The deposition of silicon by heterogeneous pyrolytic decomposition of silane (SiH/sub 4/) is used as a base case for the simulation. Predictions of the initial thin film morphology and its temporal evolution during static laser heating of micron-dimensional regions of the surface are presented. Simulation results indicate that for a given silane pressure and adsorbate--substrate binding energy, there is a critical temperature T/sub c/ such that for laser-induced peak temperatures T/sub p/T/sub c/, nucleation occurs initially in an annulus region centered with respect to the incident laser irradiation. The inclusion of two-atom cluster dynamics in the simulation is shown to increase the value of T/sub c/ and alter the initial morphology for low adsorbate--substrate binding energies.
- Research Organization:
- Physics Department, Lawrence Livermore National Laboratory, Livermore, California 94550 and Department of Applied Science, University of California, Davis/Livermore, California 94550
- OSTI ID:
- 7081933
- Journal Information:
- J. Appl. Phys.; (United States), Vol. 64:10
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
36 MATERIALS SCIENCE
CHEMICAL VAPOR DEPOSITION
COMPUTERIZED SIMULATION
MATHEMATICAL MODELS
THIN FILMS
EPITAXY
LASER RADIATION
MONTE CARLO METHOD
NUCLEATION
SILANES
CHEMICAL COATING
DEPOSITION
ELECTROMAGNETIC RADIATION
FILMS
HYDRIDES
HYDROGEN COMPOUNDS
ORGANIC COMPOUNDS
ORGANIC SILICON COMPOUNDS
RADIATIONS
SILICON COMPOUNDS
SIMULATION
SURFACE COATING
656003* - Condensed Matter Physics- Interactions between Beams & Condensed Matter- (1987-)
360601 - Other Materials- Preparation & Manufacture
360201 - Ceramics
Cermets
& Refractories- Preparation & Fabrication