Plasma-deposited amorphous hydrogenated carbon films and their tribological properties
Technical Report
·
OSTI ID:7072326
Recent work on the properties of diamondlike carbon films and their dependence on preparation conditions are reviewed. The results of the study indicate that plasma deposition enables one to deposit a variety of amorphous hydrogenated carbon (a-C:H ) films exhibiting more diamondlike behavior to more graphitic behavior. The plasma-deposited a-C:H can be effectively used as hard, wear-resistant, and protective lubricating films on ceramic materials such as Si(sub 3)N(sub 4) under a variety of environmental conditions such as moist air, dry nitrogrn, and vacuum.
- Research Organization:
- National Aeronautics and Space Administration, Cleveland, OH (USA). Lewis Research Center
- OSTI ID:
- 7072326
- Report Number(s):
- N-90-11880; NASA-TM--102379; E--5118; NAS--1.15:102379
- Country of Publication:
- United States
- Language:
- English
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