Ion spectroscopies with TOF detection. Changing the atmosphere of thin-film analysis

Journal Article · Thu Mar 31 23:00:00 EST 1994 · Analytical Chemistry (Washington); (United States)

OSTI ID:7071009

Noble, D

Alan Krauss at Argonne National Laboratory (Argonne, IL) and Albert Schultz at Ionwerks (Houston, TX) are collaborating on the development of three commercially feasible spectroscopic methods. Eventually, their instruments may be used on line to monitor and control thin-film manufacturing processes for the semiconductor industry and other applications. The techniques being developed are ion-scattering spectroscopy (ISS), direct-recoil spectroscopy (DRS), and mass spectroscopy of recoiled ions (MSRI). These methods have been grouped under the general term TOF-SARS for [open quotes]time-of-flight [ion] scattering and recoil spectroscopies[close quotes]. In combination with pulsed ion guns, TOF detectors sensitive to scattered ions and neutrals permit the use of a lower incident beam dose than is required in conventional ISS or DRS, so that the methods can be used for relatively nondestructive thin-film analysis. The TOF-SARS methods are used to determine the elemental composition of a surface based on the exchange of kinetic energy between the primary ions and the surface atoms.

• OSTI ID: 7071009
• Journal Information: Analytical Chemistry (Washington); (United States), Journal Name: Analytical Chemistry (Washington); (United States) Vol. 66:7; ISSN 0003-2700; ISSN ANCHAM
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360602* -- Other Materials-- Structure & Phase Studies
360606 -- Other Materials-- Physical Properties-- (1992-)
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
400102 -- Chemical & Spectral Procedures
FILMS
ION SPECTROSCOPY
MASS SPECTROSCOPY
MATERIALS
MEASURING INSTRUMENTS
RECOILS
SEMICONDUCTOR MATERIALS
SPECTROMETERS
SPECTROSCOPY
SURFACE PROPERTIES
THIN FILMS
TIME-OF-FLIGHT SPECTROMETERS