Comparison of Ar electron-cyclotron-resonance plasmas in three magnetic field configurations. I. Electron temperature and plasma density

Journal Article · Thu Sep 01 04:00:00 EDT 1994 · Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States)

DOI:https://doi.org/10.1116/1.579102· OSTI ID:7070954

Junck, K L ^[1]; Getty, W D ^[2]

---

1. Department of Nuclear Engineering, University of Michigan, Ann Arbor, Michigan 48109 (United States)
2. Department of Electrical Engineering and Computer Science, University of Michigan, Ann Arbor, Michigan 48109 (United States)

Optical emission spectroscopy, Langmuir probe, and microwave interferometry measurements have been used to characterize the electron temperature and plasma density of electron-cyclotron-resonance (ECR) heated Ar plasmas in a magnetic-mirror plasma tool. The magnetic field was operated in a symmetric mirror, asymmetric mirror, and minimum-B configuration. The dependency of the plasma parameters upon microwave power, pressure, and magnetic field configuration have been examined. Plasma densities up to 2[times]10[sup 12] cm[sup [minus]3] at the midplane and 5[times]10[sup 12] cm[sup [minus]3] at the ECR zone for a symmetric mirror configuration of the magnetic field have been measured. Operation of the minimum-B magnetic field configuration was found to increase the plasma stability with comparable plasma density while an asymmetric mirror magnetic field configuration, similar to other devices recently studied, yielded densities in the 2--8[times]10[sup 11] cm[sup [minus]3] range. Radial uniformity was found to be [plus minus]25% over the 4 cm radius of the microwave window.

• OSTI ID: 7070954
• Journal Information: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States), Journal Name: Journal of Vacuum Science and Technology, A (Vacuum, Surfaces and Films); (United States) Vol. 12:5; ISSN 0734-2101; ISSN JVTAD6
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
700330* -- Plasma Kinetics
Transport
& Impurities-- (1992-)
ARGON
CYCLOTRON RESONANCE
ELECTRIC PROBES
ELECTRON CYCLOTRON-RESONANCE
ELECTRON TEMPERATURE
ELEMENTS
EMISSION SPECTROSCOPY
FLUIDS
GASES
HEATING
LANGMUIR PROBE
MAGNETIC FIELD CONFIGURATIONS
MAGNETIC MIRRORS
MICROWAVE HEATING
MINIMUM-B CONFIGURATIONS
NONMETALS
OPEN CONFIGURATIONS
OPEN PLASMA DEVICES
PLASMA DENSITY
PROBES
RARE GASES
RESONANCE
SPECTROSCOPY
THERMONUCLEAR DEVICES