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Mechanism for heating of nitrogen plasmas in an electrodeless rf capacitive discharge at medium pressures

Journal Article · · High Temp. (USSR) (Engl. Transl.); (United States)
OSTI ID:7051003
The possible contributions of several processes to the experimentally observed heating of nitrogen plasmas in an electarodeless rf capacitive discharge at pressures of p=2.7-67 kPa are discussed. These processes are electron-rotational, vibrational--translational (V--T), and nonresonance vibrational--vibrational (V--V) energy exchange and effects due to O/sub 2/, H/sub 2/O, and NO impurities in the gas. It is shown that as the pressure is decreased the heating mechanism changes from quasiequilibrium to nonequilibrium V--T heating caused by overpopulation of high vibrational levels in the ground state of the nitrogen molecule.
Research Organization:
Institute for the Physical and Chemical Foundations of Mineral Processing
OSTI ID:
7051003
Journal Information:
High Temp. (USSR) (Engl. Transl.); (United States), Journal Name: High Temp. (USSR) (Engl. Transl.); (United States) Vol. 17:2; ISSN HITEA
Country of Publication:
United States
Language:
English