Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Calcium concentration dependence on the intergranular film thickness in silicon nitride

Journal Article · · Journal of the American Ceramic Society; (United States)
; ; ; ;  [1];  [2]
  1. Max Planck Inst. fuer Metallforschung, Stuttgart (Germany). Inst. fuer Werkstoffwissenschaft
  2. Univ. of California, Santa Barbara, CA (United States). Materials Dept.
High-resolution electron microscopy and nano-beam analytical electron microscopy have been used to characterize both the intergranular silicate film thickness and its local composition in a series of high-purity Si[sub 3]N[sub 4] ceramic doped with 0--450 at. ppm Ca. Calcium was detected at both two-grain junctions and triple junctions, even in the 80-ppm-Ca-doped specimen. The thickness of the intergranular film at two -grain junctions was found to depend sensitively on Ca content. In undoped material, the thickness was 1.0 [+-] 0.1 nm. With increasing Ca content, the thickness decreased in the dilute region ([<=]80 ppm Ca), but then increased. The variation in film thickness can be qualitatively understood in terms of the balance of three long-range forces acting normal to the film, namely the van der Waals dispersion force, a structural steric'' force, and an electrical-double-layer force. By comparing the measured thicknesses to those predicted, estimates for the structural correlation length and the inverse Debye length can be made. These estimates have values of [approximately]0.22 nm and approximately 0.3-0.5 nm, respectively, for the calcia-free and 80 ppm calcia materials.
OSTI ID:
7045350
Journal Information:
Journal of the American Ceramic Society; (United States), Journal Name: Journal of the American Ceramic Society; (United States) Vol. 77:4; ISSN 0002-7820; ISSN JACTAW
Country of Publication:
United States
Language:
English

Similar Records

High-temperature strength of fluorine-doped silicon nitride
Journal Article · Fri Dec 31 23:00:00 EST 1993 · Journal of the American Ceramic Society · OSTI ID:142263

Amorphous intergranular films in silicon nitride ceramics quenched from high temperatures
Journal Article · Sun Oct 31 23:00:00 EST 1993 · Journal of the American Ceramic Society; (United States) · OSTI ID:5727844

Statistical analysis of the intergranular film thickness in silicon nitride ceramics
Journal Article · Sun Aug 01 00:00:00 EDT 1993 · Journal of the American Ceramic Society; (United States) · OSTI ID:5993750