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Verification of H[sup [minus]] formation in ultraviolet-laser-irradiated hydrogen: Implications for negative ion and neutral beam technologies

Journal Article · · Journal of Applied Physics; (United States)
DOI:https://doi.org/10.1063/1.358437· OSTI ID:7041858
;  [1]
  1. Atomic, Molecular, and High Voltage Physics Group, Health Sciences Research Division, Oak Ridge National Laboratory, P.O. Box 2008, Oak Ridge, Tennessee 37831-6122 (United States) Department of Physics, University of Tennessee, Knoxville, Tennessee 37996 (United States)
Photodetachment and ion mobility measurements are reported confirming the efficient H[sup [minus]] formation in UV-laser-irradiated H[sub 2] reported earlier [L. A. Pinnaduwage and L. G. Christophorou, Phys. Rev. Lett. [bold 70], 754 (1993)]. The implications of the efficienct H[sup [minus]] formation in UV-laser-irradiated H[sub 2] (and other types of negative ions in UV-laser-irradiated gases) for negative ion and neutral particle beam technologies are discussed. Also, the possible contribution to H[sup [minus]] formation in H[sub 2] discharge sources from electron attachment to high-lying electronically excited states of H[sub 2] is indicated.
DOE Contract Number:
AC05-84OR21400
OSTI ID:
7041858
Journal Information:
Journal of Applied Physics; (United States), Journal Name: Journal of Applied Physics; (United States) Vol. 76:1; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English