The influence of preferred crystallographic orientation on blister size distribution in helium implanted surfaces

Journal Article · Fri Jul 15 04:00:00 EDT 1994 · Scripta Metallurgica et Materialia; (United States)

DOI:https://doi.org/10.1016/0956-716X(94)90179-1· OSTI ID:7037519

Zalkind, S; Moreno, D ^[1]; Lempert, G D ^[2]

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1. Nuclear Research Center-Negev, Beer Sheva (Israel)
2. Soreq Nuclear Research Center, Yavne (Israel)

Blister formation by ion implantation has been recently attributed to the near surface gas concentration and the mechanical properties of the metal. At a critical level of near surface concentration blisters are created with a typical range of diameter size for the specific material and specific implantation ion energy. Single crystal implantation with high near surface He concentration has shown different typical blister sizes due to the crystallographic directions. In the present work the authors report studies of blister formation in rolled and annealed aluminum and a Cu-Be alloy. It was observed that, as a consequence of the reflective stopping powers, there is a correlation between crystallographic orientation and resultant blister size distribution.

• OSTI ID: 7037519
• Journal Information: Scripta Metallurgica et Materialia; (United States), Journal Name: Scripta Metallurgica et Materialia; (United States) Vol. 31:2; ISSN 0956-716X; ISSN SCRMEX
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360106* -- Metals & Alloys-- Radiation Effects
ALLOYS
ALUMINIUM
BERYLLIUM ALLOYS
BLISTERS
CHARGED PARTICLES
COPPER ALLOYS
DATA
ELEMENTS
EXPERIMENTAL DATA
HELIUM IONS
INFORMATION
ION IMPLANTATION
IONS
MECHANICAL PROPERTIES
METALS
NUMERICAL DATA
STOPPING POWER