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Ion sputtering on metal oxides: A source of translationally hot O(/sup 3/P/sub J/) atoms for chemical studies above 1 eV

Journal Article · · Rev. Sci. Instrum.; (United States)
DOI:https://doi.org/10.1063/1.1139983· OSTI ID:7031226
A novel technique is described for generation of translationally ''hot'' oxygen atoms that can be used for chemical studies. These atoms are produced through ion sputtering on Ta/sub 2/ O/sub 5/ targets. Mass-resolved beams of noble gas ions in the kilovolt energy range are generated for this purpose using a 150-cm isotope separator. The technique can yield fluxes of oxygen atoms in the range of 10/sup 15/ --10/sup 16/ atoms cm/sup -2/ s/sup -1/ from a 40-keV argon ion beam with 15-..mu..A intensity. The sputtered atoms are predominantly neutral and reside exclusively in their /sup 3/P/sub J/ ground electronic state upon ejection. Translational energy profiles, measured for an incident ion beam angle of 30/sup 0/ from the surface normal, were found to be similar in both the forward and backward scattered directions at a 60/sup 0/ angle from the surface normal. These distributions peaked at about 7 eV, but extended beyond 20 eV. Theoretical calculations using a modified Thompson model yielded a similar distribution at this angle. This suggests that kilovolt ion sputtering on Ta/sub 2/ O/sub 5/ proceeds predominantly through a collision cascade mechanism. The energy range provided by this technique opens up a new area of hot-atom chemistry for oxygen atoms that has been relatively unexplored until now because of the lack of methods for their generation.
Research Organization:
Department of Chemistry, Brookhaven National Laboratory, Upton, New York 11973
OSTI ID:
7031226
Journal Information:
Rev. Sci. Instrum.; (United States), Journal Name: Rev. Sci. Instrum.; (United States) Vol. 59:10; ISSN RSINA
Country of Publication:
United States
Language:
English