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Title: A new model for grain boundary diffusion and nucleation in thin film reactions

Journal Article · · Acta Metallurgica et Materialia; (United States)
 [1];  [2]
  1. IBM, San Jose, CA (United States). Storage Systems Div.
  2. Lehigh Univ., Bethlehem, PA (United States). Dept. of Materials Science and Engineering

The authors have used non-equilibrium thermodynamics to define the chemical potential, [mu][sub i][sup I], for each species in the grain and interphase boundaries of a polycrystalline diffusion couple. The equation for [mu][sub i][sup I] thus derived leads to a characteristic decay length, L[sub i], that describes the spatial variation of [mu][sub i][sup I]. From the values of [mu][sub i][sup I], a time dependent free energy curve of the interface,'' G[sup I], was calculated and used to define the effective driving force, [Delta]g[sup eff], for product phase nucleation as a function of time. Using this approach, product nucleation in thin film reactions is seen to be similar to precipitation from a bulk homogeneous solid solution. However, the early values for [Delta]g[sup eff] were found to be considerably lower than if the interfaces were at local equilibrium resulting in the possibility of heterogeneous nucleation of even the first phase and a new approach to phase selection.

OSTI ID:
7019638
Journal Information:
Acta Metallurgica et Materialia; (United States), Vol. 42:8; ISSN 0956-7151
Country of Publication:
United States
Language:
English