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Photoemission study of reactive rare-earth/semiconductor interfaces: Tm/GaAs(110) and Yb/GaAs(110)

Journal Article · · Phys. Rev. B: Condens. Matter; (United States)
The behavior of interfaces formed by growing thin Tm and Yb films on p- and n-type GaAs(110) substrates at room temperature was investigated by photoemission from As 3d, Ga 3d, and metal 4f core levels. At metal coverages THETA<1 A, the core-level binding energies of substrate atoms are found to be shifted to higher and lower values, respectively, for p- and n-type GaAs; this observation is interpreted as a consequence of band bending due to defect states. In addition, photoemission signals from chemically reacted products at the interface are observed, which grow in intensity with metal coverage. In the coverage range 2
Research Organization:
Institut fuer Atom- und Festkoerperphysik, Freie Universitaet Berlin, Arnimallee 14, D-1000 Berlin 33, Germany
OSTI ID:
7016943
Journal Information:
Phys. Rev. B: Condens. Matter; (United States), Journal Name: Phys. Rev. B: Condens. Matter; (United States) Vol. 38:15; ISSN PRBMD
Country of Publication:
United States
Language:
English