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A 915 MHz/2. 45 GHz ECR plasma source for large area ion beam and plasma processing

Conference · · Review of Scientific Instruments; (USA)
OSTI ID:7003355
; ;  [1]
  1. Department of Electrical Engineering, Michigan State University, East Lansing, Michigan 48824-1226 (US)
The technology for producing uniform, high density (10{sup 11}--10{sup 12}/cm{sup 3}) microwave discharges over cross sections of 50 cm{sup 2} is well established. The present challenge is to extend the high density, and electrodeless benefits of microwave discharges to produce uniform densities over an area of 300--700 cm{sup 2}. Such discharges have important applications for 6 to 8-in. single wafer processing and as large surface, broad beam, high current density ion sources. The design principles for scaling the 18 cm diam MPDR ECR cavity applicator technology to 38--47 cm diam are reviewed. Microwave discharges with diameters of 20--30 cm can be created when these applicators are excited with either 2.45 GHz or 915 MHz. The design and construction of a prototype cavity applicator with a 20 cm diam discharge is described. The discharge is enclosed with a 12-pole multicusp static magnetic field produced by 2-in. by 2-in. by 1-in. rare-earth magnets. Each magnet has a pole face field strength of 3 kG. The experimental test of this plasma source in argon gas excited with 2.45 GHz energy is reviewed.
OSTI ID:
7003355
Report Number(s):
CONF-890703--
Conference Information:
Journal Name: Review of Scientific Instruments; (USA) Journal Volume: 61:1
Country of Publication:
United States
Language:
English