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U.S. Department of Energy
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Development of selective surfaces. Final technical progress report, September 11, 1978-March 31, 1980

Technical Report ·
DOI:https://doi.org/10.2172/6990931· OSTI ID:6990931
Recent advances in sputtering technology using magnetically confined plasmas in so-called magnetron configurations permit coatings to be deposited over large areas with significantly increased deposition rates. Work is described in which cylindrical-post magnetron sources were used to deposit cermet type selective absorber coatings by reactively sputtering both stainless steel and chromium in Ar-O/sub 2/ and in Ar-CO gas mixtures. In addition, Cr/Al/sub 2/O/sub 3/ graded cermet coatings were deposited by co-sputtering from Cr and Al/sub 2/O/sub 3/ post-magnetron sources. The substrates were aluminum foil and aluminum-coated glass. In other work, multi-layer Al/sub 2/O/sub 3/-Mo-Al/sub 2/O/sub 3/ coatings were deposited using both cylindrical-post and hollow magnetron sources. Both reactive sputtering and direct rf sputtering of alumina were used to form the Al/sub 2/O/sub 3/ layers. The substrates were molybdenum-coated stainless steel and glass. All of the coatings yielded hemispherical absorptances (..cap alpha../sub H/) of 0.90 or more and hemispherical emittances (epsilon/sub H/) at 20/sup 0/C of 0.10 or less. However, the Al/sub 2/O/sub 3/-Mo-Al/sub 2/O/sub 3/ coatings yielded the best optical performance (..cap alpha../sub H/ = 0.95, epsilon/sub H/ = 0.06) and thermal stability (550/sup 0/C in air and 700/sup 0/C in vacuum).
Research Organization:
TELIC Corp., Santa Monica, CA (USA)
DOE Contract Number:
AC04-78CS35306
OSTI ID:
6990931
Report Number(s):
TELIC-80-1
Country of Publication:
United States
Language:
English