Characteristics of Penning ionization gauge type compact microwave metal ion source

Journal Article · Fri Jul 01 04:00:00 EDT 1988 · J. Vac. Sci. Technol., A; (United States)

DOI:https://doi.org/10.1116/1.575571· OSTI ID:6977595

Yoshida, Y; Ohnishi, T; Hirofuji, Y

A sputtering ion source utilizing both microwave and Penning ionization gauge (PIG) ionizations for the primary ion beam deposition is described. The size of the source is 60 mm in diameter and 80 mm long. The continuous ion beams of refractory metals (Ta, W, Mo) with the ion currents of 100 to 150 ..mu..A are obtained for gas pressure on the order of 10/sup -3/ Torr in the plasma production chamber, microwave power under 40 W, and PIG discharge power under 80 W. This source has been operated with two different discharge modes, either glow discharge or arc discharge. Operation of both modes becomes quite stable by introducing microwave power. Metal ion production by glow discharge is more efficient in power consumption than that by arc discharge.

• Research Organization: Production Engineering Laboratories, Matsushita Electric Industrial Co., Ltd., Kadoma, Osaka 571, Japan
• OSTI ID: 6977595
• Journal Information: J. Vac. Sci. Technol., A; (United States), Journal Name: J. Vac. Sci. Technol., A; (United States) Vol. 6:4; ISSN JVTAD
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360101* -- Metals & Alloys-- Preparation & Fabrication
DEPOSITION
ELECTRIC DISCHARGES
ELEMENTS
FABRICATION
FILMS
GLOW DISCHARGES
ION SOURCES
IONIZATION GAGES
MEASURING INSTRUMENTS
METALS
MOLYBDENUM
OPERATION
PRESSURE GAGES
SPUTTERING
SURFACE COATING
TANTALUM
THIN FILMS
TRANSITION ELEMENTS
TUNGSTEN
VACUUM GAGES