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Oxidation kinetics of hafnium carbide in the temperature range of 480 [degrees] to 600 [degrees] C

Journal Article · · Journal of the American Ceramic Society; (United States)
;  [1];  [2]
  1. Dept. of Applied Chemistry, Faculty of Engineering, Hokkaido Univ., Sapporo 060 (Japan)
  2. Central Research Lab., Idemitsu Kosan Co., Ltd., Sodegaura Chiba 299-02 (Japan)
This paper reports on the isothermal oxidation of HfC powders which was carried out at temperatures of 480[degrees] C to 600[degrees] C at oxygen pressures of 4, 8, and 16 kPa, using an electromicrobalance. The oxidized product was identified by X-ray analysis, Raman spectroscopy, X-ray photoelectron spectroscopy, and electron diffraction, and the morphology of the oxidized grains was observed by scanning electron microscopy. Oxidation proceeds by two processes: a diffusion-controlled process operates up to about 50% oxidation and a phase-boundary-controlled process operates above about 50% oxidation. The activation energies for both processes are the same (197 [plus minus] 15 kJ [center dot] mol[sup [minus] 1]). The change in the oxidation process is associated with the generation of cracks on the grains, resulting from the growth or expansion stress due to the formation of monoclinic HfO[sub 2] microcrystallites less than 3 nm in size.
OSTI ID:
6973140
Journal Information:
Journal of the American Ceramic Society; (United States), Journal Name: Journal of the American Ceramic Society; (United States) Vol. 75:10; ISSN 0002-7820; ISSN JACTAW
Country of Publication:
United States
Language:
English