Theoretical simulation of electron-beam-excited xenon-chloride (XeCl) lasers

Journal Article · Sat Oct 01 04:00:00 EDT 1983 · IEEE J. Quant. Electron.; (United States)

DOI:https://doi.org/10.1109/JQE.1983.1071763· OSTI ID:6969466

Kannari, F; Fujioka, T; Obara, M; Suda, A

By developing a comprehensive computer code for e-beam excited XeCl lasers, the authors studied mainly the effect of Ar and Ne diluents on the performance characteristics of XeCl lasers. According to the analysis of the XeCl* formation process, the XeCl* relaxation process, and the 308 nm absorption process, it is found that the XeCl* formation efficiency is determined mainly by the rate of the charge transfer process (from Ar/sup +/ and Ne/sup +/ diluent ions to Xe/sup +/); in other words, by the difference between ionic potentials of Xe and the diluent gas used. The extraction efficiency is found to be decided mainly by the quenching rate of a three-body reaction for a short-pulse (55 ns) and a high-excitation-rate (about 3 MW/cm/sup 3/) pumping, and by the absorption process for a long-pulse (500 ns) and a low-excitation-rate (about 0.2 MW/cm/sup 3/) pumping. However, no appreciable difference in the intrinsic efficiency is found between the Ar/Xe/HCl and Ne/Xe/HCl mixtures. The authors also analyzed the dependence of the intrinsic XeCl laser efficiency on the pumping pulse width and excitation rate for Ar/Xe/HCl and Ne/Xe/HCl mixtures. As a result, the same intrinsic efficiencies are obtainable for both Ar- and Ne-based mixtures although the optimum operating conditions are slightly different. The maximum intrinsic efficiency of 5 percent is obtainable both for the Ar/Xe/HCl mixture at 3 atm and with 1.5 MW/cm/sup 3/, 200 ns (FWHM) pumping and for the Ne/Xe/HCl mixture at 4 atm and with 2 MW/cm/sup 3/, 200 ns (FWHM) pumping.

• Research Organization: Dept. of Electrical Engineering, Faculty of Science and Technology, Keio University, 3-14-1, Hiyoshi, Kohoku-ku, Yokohama-shi, 223
• OSTI ID: 6969466
• Journal Information: IEEE J. Quant. Electron.; (United States), Journal Name: IEEE J. Quant. Electron.; (United States) Vol. 19:10; ISSN IEJQA
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
420300* -- Engineering-- Lasers-- (-1989)
ARGON
BEAMS
CHLORIDES
CHLORINE COMPOUNDS
COMPUTER CODES
COMPUTERIZED SIMULATION
DATA
ELECTRICAL PUMPING
ELECTRON BEAM PUMPING
ELECTRON BEAMS
ELEMENTS
EXCIMER LASERS
FLUIDS
GAS LASERS
GASES
HALIDES
HALOGEN COMPOUNDS
HYDROCHLORIC ACID
HYDROGEN COMPOUNDS
INFORMATION
INORGANIC ACIDS
LASERS
LEPTON BEAMS
NEON
NONMETALS
NUMERICAL DATA
PARTICLE BEAMS
PUMPING
RARE GAS COMPOUNDS
RARE GASES
SIMULATION
THEORETICAL DATA
XENON CHLORIDES
XENON COMPOUNDS