Preparation of TbFeCo thin films with large Kerr rotation angle by facing targets sputtering
Journal Article
·
· Journal of Applied Physics; (USA)
- Corporate Research and Development Laboratory, Pioneer Electronic Corp., Tsurugashima-machi, Saitama, 350-02, Japan (JP)
- Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152, Japan (JP)
The TbFeCo films were prepared at argon gas pressure {ital P}{sub Ar} of 0.8 and 3.6 mTorr by using the facing targets sputtering (FTS) apparatus. The films showed the polar Kerr rotation angle {theta}{sub {ital k}} as large as 0.43{degree} at a wavelength of 830 nm. In polar Kerr hysteresis loops, the films with large {theta}{sub {ital k}} showed the rectangular loops in which the gradient of magnetization at an applied field of coercivity was extremely large. Moreover, the films deposited at {ital P}{sub Ar} of 0.8 mTorr showed the strong wavelength dependence of {theta}{sub {ital k}} compared with the ones deposited at {ital P}{sub Ar} of 3.6 mTorr.
- OSTI ID:
- 6949776
- Journal Information:
- Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:9; ISSN 0021-8979; ISSN JAPIA
- Country of Publication:
- United States
- Language:
- English
Similar Records
Effect of nitrogen upon enhancement of the magnetic Kerr rotation in ZnS(O,N)/TbFeCo bilayer films
Characterization of amorphous TbFeCo films for magneto-optical media
Effects of deposition angle on perpendicular anisotropy and internal stress in evaporated TbFeCo films
Journal Article
·
Tue May 01 00:00:00 EDT 1990
· Journal of Applied Physics; (USA)
·
OSTI ID:6950228
Characterization of amorphous TbFeCo films for magneto-optical media
Journal Article
·
Fri Apr 15 00:00:00 EDT 1988
· J. Appl. Phys.; (United States)
·
OSTI ID:5390977
Effects of deposition angle on perpendicular anisotropy and internal stress in evaporated TbFeCo films
Journal Article
·
Wed Dec 14 23:00:00 EST 1988
· J. Appl. Phys.; (United States)
·
OSTI ID:6664194