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Preparation of TbFeCo thin films with large Kerr rotation angle by facing targets sputtering

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.344593· OSTI ID:6949776
;  [1];  [2]
  1. Corporate Research and Development Laboratory, Pioneer Electronic Corp., Tsurugashima-machi, Saitama, 350-02, Japan (JP)
  2. Department of Physical Electronics, Tokyo Institute of Technology, 2-12-1 O-okayama, Meguro-ku, Tokyo 152, Japan (JP)

The TbFeCo films were prepared at argon gas pressure {ital P}{sub Ar} of 0.8 and 3.6 mTorr by using the facing targets sputtering (FTS) apparatus. The films showed the polar Kerr rotation angle {theta}{sub {ital k}} as large as 0.43{degree} at a wavelength of 830 nm. In polar Kerr hysteresis loops, the films with large {theta}{sub {ital k}} showed the rectangular loops in which the gradient of magnetization at an applied field of coercivity was extremely large. Moreover, the films deposited at {ital P}{sub Ar} of 0.8 mTorr showed the strong wavelength dependence of {theta}{sub {ital k}} compared with the ones deposited at {ital P}{sub Ar} of 3.6 mTorr.

OSTI ID:
6949776
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:9; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English

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