Deposition of indium tin oxide films on acrylic substrates by radiofrequency magnetron sputtering

Journal Article · Fri Jul 01 00:00:00 EDT 1994 · Journal of the American Ceramic Society; (United States)

DOI:https://doi.org/10.1111/j.1151-2916.1994.tb07044.x· OSTI ID:6934053

Chiou, B S; Hsieh, S T; Wu, W F ^[1]

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1. National Chiao Tung Univ., Hsinshu (Taiwan, Province of China). Dept. of Electronics Engineering

Indium tin oxide (ITO) films were deposited onto acrylic substrates by rf magnetron sputtering. Low substrate temperature (< 80 C) and low rf power (< 28 W) were maintained during sputtering to prevent acrylic substrate deformation. The influence of sputtering parameters, such as rf power, target-to-substrate distance, and chamber pressure, on the film deposition rate, the electrical properties, as well as the optical properties of the deposited films was investigated. Both the refractive index and the extinction coefficient were derived. The high reflection at wavelengths greater than 3 [mu]m made these sputtered ITO films applicable to infrared mirrors.

• OSTI ID: 6934053
• Journal Information: Journal of the American Ceramic Society; (United States), Journal Name: Journal of the American Ceramic Society; (United States) Vol. 77:7; ISSN 0002-7820; ISSN JACTAW
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
&amp; Refractories-- Preparation &amp; Fabrication
CHALCOGENIDES
DATA
DEPOSITION
EXPERIMENTAL DATA
INDIUM COMPOUNDS
INDIUM OXIDES
INFORMATION
NUMERICAL DATA
OXIDES
OXYGEN COMPOUNDS
PHYSICAL PROPERTIES
SPUTTERING
TIN COMPOUNDS
TIN OXIDES