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Thermal electron attachment to NO. I. The mechanism and the three-body rate constants

Journal Article · · J. Chem. Phys.; (United States)
DOI:https://doi.org/10.1063/1.454999· OSTI ID:6925976
Mechanism of thermal electron attachment in pure NO and NO--M mixtures (M: He, Ne, Ar, H/sub 2/ , CO/sub 2/ , and n-C/sub 4/H/sub 10/ ) at room temperature has been studied by using a pulse radiolysis--microwave cavity technique. The pressure dependence of the attachment rates indicates that a collisional electron detachment from NO/sup -/ competes with electron attachment at relatively low pressures but three-body attachment dominates at higher pressures. The three-body rate constants in pure NO is (6.5 +- 0.2) x 10/sup -31/ cm/sup 6/ molecule/sup -2/ s/sup -1/ and those values for the other gases as third bodies range from 1 x 10/sup -32/ (for He) to 3.6 x 10/sup -30/ cm/sup 6/ molecule/sup -2/ s/sup -1/ (for n-C/sub 4/H/sub 10/), and no systematic correspondence can be seen between the values obtained here and those estimated previously from the data of reverse (electron detachment) processes.
Research Organization:
Fukui Institute of Technology, 3-6-1 Gakuen, Fukui 910, Japan
OSTI ID:
6925976
Journal Information:
J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 89:5; ISSN JCPSA
Country of Publication:
United States
Language:
English