Near-infrared reflectance modulation with electrochromic crystalline WO sub 3 films deposited on ambient temperature glass substrates by an oxygen ion-assisted technique

Journal Article · Thu Mar 15 04:00:00 EST 1990 · Journal of Applied Physics; (USA)

DOI:https://doi.org/10.1063/1.345397· OSTI ID:6910871

Arntz, F O; Goldner, R B; Morel, B; Hass, T E; Wong, K K ^[1]

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1. Electro-Optics Technology Center, Tufts University, Medford, Massachusetts 02155 (US)

Electrochromic, crystalline WO{sub 3} films have been deposited on glass substrates at ambient temperature by an oxygen-ion-assisted technique using oxygen ion energies {ge}300 eV and oxygen ion to vapor molecule (WO{sub 3}) ratios, {gamma}{ge}2.5. After lithiation, the resulting Li{sub {ital x}}WO{sub 3} films exhibited {gt}50% reflectivity in the near infrared, and the reflectivity dispersion was fit by a Drude free-electron model, yielding the Drude parameters: plasma energy, {ital E}{sub {ital p}}=3.3 eV; and the loss (damping) parameter, {ital E}{sub {Gamma}}=1.0 eV. (The bound electron permittivity, {epsilon}{sub {ital b}}, was fixed at 4.0.) These values are comparable to those obtained with WO{sub 3} films rf sputter deposited onto substrates at temperatures {gt}420 {degree}C. During the ion-assisted deposition the substrate temperature reached approximately 90 {degree}C, caused primarily by radiation from the WO{sub 3} evaporant source. This indicates that economical low-temperature substrates, such as plastics, could be used. These results suggest that practical electrochromic smart windows for energy-efficient buildings might be produced using ion-assisted deposition techniques.

• DOE Contract Number: FG03-85SF15927
• OSTI ID: 6910871
• Journal Information: Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:6; ISSN 0021-8979; ISSN JAPIA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360204* -- Ceramics
Cermets
& Refractories-- Physical Properties
CHALCOGENIDES
CHARGED PARTICLES
DEPOSITION
DISPERSION RELATIONS
ELECTROMAGNETIC RADIATION
FILMS
GLASS
INFRARED RADIATION
ION IMPLANTATION
IONS
NEAR INFRARED RADIATION
OPTICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
OXYGEN IONS
PHYSICAL PROPERTIES
RADIATIONS
REFLECTIVITY
REFRACTORY METAL COMPOUNDS
SUBSTRATES
SURFACE PROPERTIES
TRANSITION ELEMENT COMPOUNDS
TUNGSTEN COMPOUNDS
TUNGSTEN OXIDES