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Title: Spreading of a liquid film on a substrate by the evaporation-adsorption process

Journal Article · · Journal of Colloid and Interface Science; (United States)
;  [1]
  1. Rensselaer Polytechnic Inst., Troy, NY (United States). Isermann Dept. of Chemical Engineering

The importance of evaporation followed by multilayer adsorption in comparison to liquid flow at the leading edge of a volatile spreading film is analyzed. Presuming that both flows are functions of the same chemical potential gradient, a dimensionless group (N) which delineates the relative importance of vapor diffusion flow to viscous flow on the surface is obtained: N = [rho][sub i]D[nu]x/([minus][bar A][pi]). The relative importance of vapor flow increases with the vapor-pressure dependent partial density, [rho][sub i], and diffusivity, D, of the diffusing vapor, the kinematic viscosity of the liquid, [nu], and the distance downstream from the bulk liquid region, x, and decreases with the Hamaker constant, 6[pi][bar A]. Using physical properties the modifiers volatile'' and nonvolatile'' can thereby be put in perspective. Changes in the interfacial force field are a function of [bar A]. The spreading velocity due to the vapor diffusion process is obtained and is found to decrease with a decrease in the interfacial force field and the bulk vapor pressure. The infinite stress at the contact line can be easily relieved by evaporation-adsorption in many systems.

DOE Contract Number:
FG02-89ER14045
OSTI ID:
6908867
Journal Information:
Journal of Colloid and Interface Science; (United States), Vol. 152:2; ISSN 0021-9797
Country of Publication:
United States
Language:
English