Determination of critical thickness of spin reorientation in metastable magnetic ultrathin films

Journal Article · Sun Oct 31 23:00:00 EST 1999 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.125210· OSTI ID:687984

Shen, J; Swan, A K; Wendelken, J F ^[1]

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1. Solid State Division, Oak Ridge National Laboratory, Oak Ridge, Tennessee 37831-6057 (United States)

We investigate the spin reorientation of structurally unstable magnetic ultrathin films (base films) using magnetic capping layers. The capping layers, whose effective anisotropy constant is opposite that of the base films, are grown on the base films with no transformed structure and induce a spin reorientation after exceeding a critical thickness. The critical thickness of the capping layers can be used to deduce the critical thickness as well as the anisotropy constants of the base films. We use Co to cap the well-known Fe/Cu(100) system as an example to demonstrate the proposed approach. {copyright} {ital 1999 American Institute of Physics.}

• OSTI ID: 687984
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 19 Vol. 75; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANISOTROPY
COBALT
COPPER
IRON
MAGNETIZATION
SPIN FLIP
THICKNESS
THIN FILMS