Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Higher resolution photoionization study of NO near the threshold

Journal Article · · J. Chem. Phys.; (United States)
DOI:https://doi.org/10.1063/1.440013· OSTI ID:6878624

The photoionization efficiency curve for NO/sup +/ has been obtained at a resolution of 0.14 A (FWHM) in the region 1189--1340 A using the molecular beam method. The observed autoionization peaks can be satisfactorily correlated with the positions of the Rydberg levels (ns, npsigma, np..pi.., ndsigma, nd..pi.., nddelta, and nf) observed or calculated with the quantum defects deduced from previous absorption experiments. The analysis of the autoionization structure suggests that autoionization via ..delta..v=-1 processess are not strongly favored in comparison to ..delta..v<-1 processes in NO. The degree of relaxation of NO (/sup 2/Pi/sub 3/2/) in a supersonic expansion has also been examined by comparing the relative intensity of the autoionization structure at different nozzle temperatures. A small step at 1341.5 A which is approximately 124 cm/sup -1/ lower in energy that the first onset at at 1339.32 A is attributed to the threshold for the NO (X /sup 2/ ..sigma../sup +/ v=0) reverse arrow NO (X /sup 2/Pi/sub 3/2/ v=0) transition. This observation is in agreement with the previous finding that the relaxation from /sup 2/Pi/sub 3/2/ to /sup 2/Pi/sub 1/2/ in a free jet expansion is efficient.

Research Organization:
Ames Laboratory, U.S. Department of Energy, and Department of Chemistry, Iowa State University, Ames, Iowa 50011
OSTI ID:
6878624
Journal Information:
J. Chem. Phys.; (United States), Journal Name: J. Chem. Phys.; (United States) Vol. 73:10; ISSN JCPSA
Country of Publication:
United States
Language:
English