Strengthening of alumina by reactions with silicon film on the surface and effects of ion irradiation

Journal Article · Mon Sep 01 04:00:00 EDT 1986 · J. Am. Ceram. Soc.; (United States)

DOI:https://doi.org/10.1111/j.1151-2916.1986.tb07481.x· OSTI ID:6878240

Noda, S; Doi, H; Hioki, T; Kawamoto, J I; Kamigaito, O

Deposition of Si film on sintered alumina, followed by annealing at 1673 K in air, increased the flexural strength by approx. = 28%. Mullite formation on the surface was confirmed by X-ray diffraction analysis. Ion irradiation of the Si/alumina interface, followed by annealing, produced anorthite but not mullite, and the flexural strength also increased by approx. = 35%. Thermal expansion mismatch between surface compounds and the alumina body may be responsible for the strengthening.

• Research Organization: Toyota Central Research and Development Labs., Inc., Nagakute-cho, Aichi-gun, Aichi-ken, 480-11
• OSTI ID: 6878240
• Journal Information: J. Am. Ceram. Soc.; (United States), Journal Name: J. Am. Ceram. Soc.; (United States) Vol. 69:9; ISSN JACTA
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
360201* -- Ceramics
Cermets
& Refractories-- Preparation & Fabrication
360203 -- Ceramics
Cermets
& Refractories-- Mechanical Properties
ALUMINIUM COMPOUNDS
ALUMINIUM OXIDES
ANNEALING
CERAMICS
CHALCOGENIDES
CHEMICAL COMPOSITION
CHEMICAL REACTION KINETICS
COHERENT SCATTERING
COMPRESSION
DEPOSITION
DIFFRACTION
ELEMENTS
EXPANSION
EXPERIMENT PLANNING
FABRICATION
FILMS
HEAT TREATMENTS
IRRADIATION
KINETICS
MECHANICAL PROPERTIES
OXIDES
OXYGEN COMPOUNDS
PLANNING
REACTION KINETICS
SCATTERING
SEMIMETALS
SILICON
SINTERING
STRESSES
SURFACES
TENSILE PROPERTIES
THERMAL EXPANSION
THIN FILMS
VERY HIGH TEMPERATURE
X-RAY DIFFRACTION