Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

Aging and its circumvention in rf-plasma oxidized Pb-alloy Josephson junctions

Journal Article · · J. Appl. Phys.; (United States)
DOI:https://doi.org/10.1063/1.338291· OSTI ID:6876130

The aging phenomenon of Pb-alloy Josephson junctions is investigated and an effective method of circumventing it is presented. Junctions consist of Pb-alloy electrodes and a tunneling barrier formed by rf-plasma oxidation of the Pb-alloy. First, aging and annealing-driven change in normal tunneling resistance are compared to verify the usage of annealing as an experimental method for simulation and acceleration of aging. Next, process variables affecting the annealing change in junction characteristics are examined and their influence is described. The importance of the oxide-base electrode interface is confirmed and that of the counterelectrode-oxide interface is experimentally shown. Furthermore, possible changes in the oxide itself are discussed. Finally, on the basis of these studies, rf-plasma oxidation in a CO/sub 2/ atmosphere is employed and proven to be an effective method for circumventing the annealing change in the junction characteristics.

Research Organization:
NTT Electrical Communications Laboratories, 3--1 Morinosato Wakamiya, Atsugi, Kanagawa 243-01, Japan
OSTI ID:
6876130
Journal Information:
J. Appl. Phys.; (United States), Journal Name: J. Appl. Phys.; (United States) Vol. 61:11; ISSN JAPIA
Country of Publication:
United States
Language:
English

Similar Records

Aging phenomena of plasma oxidized Pb-alloy Josephson junctions
Journal Article · Fri Aug 01 00:00:00 EDT 1980 · J. Appl. Phys.; (United States) · OSTI ID:5181659

Properties on niobium-based Josephson tunneling elements in junction microstructures
Journal Article · Thu Jul 01 00:00:00 EDT 1982 · J. Low Temp. Phys.; (United States) · OSTI ID:6737527

Influence of thermal oxide on leakage current for Pb-alloy Josephson junctions
Journal Article · Fri Mar 14 23:00:00 EST 1986 · J. Appl. Phys.; (United States) · OSTI ID:5953595