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Theory of multistage intense ion-beam acceleration

Journal Article · · Journal of Applied Physics; (USA)
DOI:https://doi.org/10.1063/1.345108· OSTI ID:6874844
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  1. Sandia National Laboratories, Pulsed Power Theory Division, Albuquerque, New Mexico 87185 (USA)
We present an analytic theory for magnetically insulated, multistage acceleration of high-intensity ion beams, where the diamagnetic effect due to electron flow is important. Our theory is an extension of the single-stage diode theory developed by Desjarlais (Phys. Rev. Lett. {bold 59}, 2295 (1987)), based on a self-consistent calculation of the virtual cathode position, which has been successful in modeling Applied-{ital B} ion diode experiments on several accelerators. The new theory incorporates a finite injection energy {ital qW} for the beam ions. We have found a critical voltage {ital V}{sub 1}({ital W}) that corresponds to {ital V}{sub *} of the single-stage theory. As the voltage approaches {ital V}{sub 1}, unlimited beam-current density can penetrate the gap without the formation of a virtual anode because the dynamic gap goes to zero. At voltages lower than {ital V}{sub 1}, a sufficiently large injection current will cause the formation of a virtual anode in response to the large beam space charge. Furthermore, we have found that unlimited beam current can penetrate an accelerating gap operated above a second critical voltage {ital V}{sub 2}({ital W}). At voltages below {ital V}{sub 2}, there is a maximum steady-state current that can be transmitted through the gap. The critical voltage {ital V}{sub 2} is smaller than {ital V}{sub 1} and is unique to the multistage theory. If fluctuations allow electron transport across magnetic field lines so that any virtual anode is neutralized, {ital V}{sub 2} goes to zero for all beam injection energies. This effect can be used to test the importance of field fluctuations on the electron dynamics in magnetically insulated ion acceleration gaps.
DOE Contract Number:
AC04-76DP00789
OSTI ID:
6874844
Journal Information:
Journal of Applied Physics; (USA), Journal Name: Journal of Applied Physics; (USA) Vol. 67:11; ISSN 0021-8979; ISSN JAPIA
Country of Publication:
United States
Language:
English