Band-gap control of GaInP using Sb as a surfactant
- College of Engineering, University of Utah, Salt Lake City, Utah 84112 (United States)
The use of surfactants to control specific aspects of the vapor-phase epitaxial growth process is beginning to be studied for both the elemental and III/V semiconductors. To date, most reported surfactant effects for semiconductors relate to the morphology of the growing films. However, semiconductor alloys with CuPt ordering exhibit much more dramatic effects. The change in the CuPt order parameter induced by the surfactant translates into a marked change in the band-gap energy. Previous work concentrated on the effects of the donor tellurium. Te is less than ideal as a surfactant, since the change in band-gap energy is coupled to a large change in the conductivity. This letter presents the results of a study of the effects of an isoelectronic surfactant on the ordering process in GaInP. Sb has been found to act as a surfactant during organometallic vapor-phase epitaxial growth. At an estimated Sb concentration in the solid of 1{times}10{sup {minus}4}, order is eliminated, as indicated by the band-gap energy. Surface photoabsorption (SPA) data indicate that the effect is due to a change in the surface reconstruction. Adding Sb leads to attenuation of the peak at 400 nm in the SPA spectrum associated with [{bar 1}10] P dimers. The addition of Sb during the growth cycle has been used to produce a heterostructure with a 135 meV band-gap difference between two layers with the same solid composition. {copyright} {ital 1999 American Institute of Physics.}
- OSTI ID:
- 686432
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 13 Vol. 75; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
Similar Records
The use of a surfactant (Sb) to induce triple period ordering in GaInP
Surfactant controlled growth of GaInP by organometallic vapor phase epitaxy
Surface photoabsorption transients and ordering in GaInP
Journal Article
·
Sun Mar 12 23:00:00 EST 2000
· Applied Physics Letters
·
OSTI ID:20215579
Surfactant controlled growth of GaInP by organometallic vapor phase epitaxy
Journal Article
·
Sat Apr 15 00:00:00 EDT 2000
· Journal of Applied Physics
·
OSTI ID:20215800
Surface photoabsorption transients and ordering in GaInP
Journal Article
·
Sat Feb 28 23:00:00 EST 1998
· Journal of Applied Physics
·
OSTI ID:580317