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Resistance to pitting and chemical composition of passive films of a Fe-17%Cr alloy in chloride-containing acid solution

Journal Article · · Journal of the Electrochemical Society; (United States)
DOI:https://doi.org/10.1149/1.2059166· OSTI ID:6822384
; ;  [1]
  1. Ecole Nationale Superieure de Chimie de Paris (France). Lab. de Physico-Chimie des Surfaces
The resistance to pitting of a Fe-17%Cr alloy in Cl[sup [minus]]-containing solution (0.5M H[sub 2]SO[sub 4] + 0.3M NaCl) and its relationship with the chemical composition of the passive film have been studied by electrochemical and x-ray photoelectron spectroscopy analyses. Aging of the passive film in the acid solution without or with Cl[sup [minus]] (at a potential below the pitting potential) improves the resistance to pitting. The passive films formed in 0.5M H[sub 2]SO[sub 4] (at +500 mV/SHE) have a bilayer structure (hydroxide and oxide) already well developed after 5 min of passivation. The thickness of the passive film ([approximately]26 to 28 [angstrom]) remains constant during polarization. The average cation fraction of chromium in the oxide increases with increasing polarization time (from 35% after 5 min of polarization to 80% after 24 h of polarization). The beneficial effect of aging on the resistance to pitting is attributed to the enhancement of the chromium oxide enrichment at the film/alloy interface. The passive films exposed to Cl[sup [minus]] or formed in Cl[sup [minus]]-containing solution (0.3M NaCl) have similar composition and thickness as the films formed in Cl[sup [minus]]-free solution, but they contain Cl[sup [minus]]. The Cl[sup [minus]] ions are located mainly in the hydroxide layer ([approximately]0.016 mol [center dot] cm[sup [minus]3]). A very small amount of Cl[sup [minus]] is found in the inner oxide layer.
OSTI ID:
6822384
Journal Information:
Journal of the Electrochemical Society; (United States), Journal Name: Journal of the Electrochemical Society; (United States) Vol. 141:10; ISSN JESOAN; ISSN 0013-4651
Country of Publication:
United States
Language:
English